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Electrical Conduction Mechanisms in Metal–Insulator–Metal (MIM) Structure with TiO x N y Thin Films Deposited with Different O/N Ratios

Crossref DOI link: https://doi.org/10.1007/s11664-014-3470-1

Published Online: 2014-11-19

Published Print: 2015-01

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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