Growth of Wide-Bandgap Nanocrystalline Silicon Carbide Films by HWCVD: Influence of Filament Temperature on Structural and Optoelectronic Properties
Crossref DOI link: https://doi.org/10.1007/s11664-014-3580-9
Published Online: 2015-01-07
Published Print: 2015-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Jha, Himanshu S.
Yadav, Asha
Singh, Mukesh
Kumar, Shailendra
Agarwal, Pratima
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