Validation of the Dynamic Recrystallization (DRX) Mechanism for Whisker and Hillock Growth on Sn Thin Films
Crossref DOI link: https://doi.org/10.1007/s11664-015-3779-4
Published Online: 2015-05-01
Published Print: 2015-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Vianco, P. T.
Neilsen, M. K.
Rejent, J. A.
Grant, R. P.
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