Improving the H2 Gas Sensitivity of ZnO Thin Films by Modifying the Annealing Conditions
Crossref DOI link: https://doi.org/10.1007/s11664-015-3833-2
Published Online: 2015-05-20
Published Print: 2015-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Khojier, K.
Savaloni, H.
Text and Data Mining valid from 2015-05-20