Preparation of Ca-Si Films on (001) Al2O3 Substrates by an RF Magnetron Sputtering Method and Their Electrical Properties
Crossref DOI link: https://doi.org/10.1007/s11664-016-4404-x
Published Online: 2016-03-02
Published Print: 2016-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Uehara, Mutsuo
Akiyama, Kensuke
Shimizu, Takao
Matsushima, Masaaki
Uchida, Hiroshi
Kimura, Yoshisato
Funakubo, Hiroshi
Text and Data Mining valid from 2016-03-02