Dry Etching Characteristics of MOVPE-Grown CdTe Epilayers in CH4, H2, Ar ECR Plasmas
Crossref DOI link: https://doi.org/10.1007/s11664-017-5528-3
Published Online: 2017-04-27
Published Print: 2017-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Yasuda, K.
Niraula, M.
Araki, N.
Miyata, M.
Kitagawa, S.
Kojima, M.
Ozawa, J.
Tsubota, S.
Yamaguchi, T.
Agata, Y.
License valid from 2017-04-27