Effect of Nitrogen Content on Physical and Chemical Properties of TiN Thin Films Prepared by DC Magnetron Sputtering with Supported Discharge
Crossref DOI link: https://doi.org/10.1007/s11664-017-5608-4
Published Online: 2017-06-05
Published Print: 2017-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kavitha, A.
Kannan, R.
Gunasekhar, K. R.
Rajashabala, S.
License valid from 2017-06-05