Characterization and Electrochemical Performance at High Discharge Rates of Tin Dioxide Thin Films Synthesized by Atomic Layer Deposition
Crossref DOI link: https://doi.org/10.1007/s11664-017-5701-8
Published Online: 2017-07-26
Published Print: 2017-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Maximov, M. Yu.
Novikov, P. A.
Nazarov, D. V.
Rymyantsev, A. M.
Silin, A. O.
Zhang, Y.
Popovich, A. A.
Funding for this research was provided by:
Russian Foundation for Basic Research (16-33-01030)
License valid from 2017-07-26