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Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry

Crossref DOI link: https://doi.org/10.1007/s11664-018-6152-6

Published Online: 2018-02-26

Published Print: 2018-09

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Landesman, Jean-Pierre

Cassidy, Daniel T.

Fouchier, Marc

Pargon, Erwine

Levallois, Christophe

Mokhtari, Merwan

Jimenez, Juan

Torres, Alfredo
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Article History

Received: 13 November 2017

Accepted: 14 February 2018

First Online: 26 February 2018