X-ray Diffraction Residual Stress Measurement at Room Temperature and 77 K in a Microelectronic Multi-layered Single-Crystal Structure Used for Infrared Detection
Crossref DOI link: https://doi.org/10.1007/s11664-018-6560-7
Published Online: 2018-08-13
Published Print: 2018-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Lebaudy, A.-L. http://orcid.org/0000-0003-2450-6818
Pesci, R.
Fendler, M.
Text and Data Mining valid from 2018-08-13
Article History
Received: 20 December 2017
Accepted: 28 July 2018
First Online: 13 August 2018