Beneficial Effect of Two-Step Annealing via Low Temperature of Vacancy Complexes in N-type Czochralski Silicon
Crossref DOI link: https://doi.org/10.1007/s11664-018-6732-5
Published Online: 2018-10-25
Published Print: 2019-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Hannachi, Mohamed
Amri, Chohdi
Hedfi, Hachem
Zarroug, Ahmed
Ezzaouia, Hatem
Text and Data Mining valid from 2018-10-25
Article History
Received: 27 March 2018
Accepted: 8 October 2018
First Online: 25 October 2018