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Effect of Seed Layer and Thermal Annealing on Structural and Optical Properties of Silicon Layers Deposited by PECVD

Crossref DOI link: https://doi.org/10.1007/s11664-019-07143-4

Published Online: 2019-03-25

Published Print: 2019-06

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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