Stress-Induced Variability Studies in Tri-Gate FinFETs with Source/Drain Stressor at 7 nm Technology Nodes
Crossref DOI link: https://doi.org/10.1007/s11664-019-07348-7
Published Online: 2019-06-11
Published Print: 2019-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Dash, T. P. http://orcid.org/0000-0001-6370-8573
Jena, J.
Mohapatra, E.
Dey, S.
Das, S.
Maiti, C. K.
Text and Data Mining valid from 2019-06-11
Version of Record valid from 2019-06-11
Article History
Received: 18 March 2019
Accepted: 1 June 2019
First Online: 11 June 2019