Photoelastic Characterization of Residual Strain Distribution in Commercial Off-Axis SiC Substrates
Crossref DOI link: https://doi.org/10.1007/s11664-020-08211-w
Published Online: 2020-05-20
Published Print: 2020-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Fukuzawa, Masayuki https://orcid.org/0000-0002-6457-3233
Kanamoto, Kazuki
Funding for this research was provided by:
Japan Society for the Promotion of Science
Text and Data Mining valid from 2020-05-20
Version of Record valid from 2020-05-20
Article History
Received: 17 December 2019
Accepted: 8 May 2020
First Online: 20 May 2020