Optimization of Thick Photoresist for Uniform Thickness in RF MEMS Applications
Crossref DOI link: https://doi.org/10.1007/s11664-021-09225-8
Published Online: 2021-09-30
Published Print: 2021-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Bajpai, Anuroop http://orcid.org/0000-0002-4943-397X
Rangra, Kamaljit
Bansal, Deepak
Text and Data Mining valid from 2021-09-30
Version of Record valid from 2021-09-30
Article History
Received: 5 July 2021
Accepted: 7 September 2021
First Online: 30 September 2021
Conflict of Interest
: The authors declare that they have no conflict of interest.