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Complex High-κ Oxides for Gate Dielectric Applications

Crossref DOI link: https://doi.org/10.1007/s11664-022-09724-2

Published Online: 2022-06-22

Published Print: 2022-09

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Ahadi, Kaveh https://orcid.org/0000-0003-2280-4037
Cadien, Ken
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Text and Data Mining valid from 2022-06-22

Version of Record valid from 2022-06-22
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Article History

Received: 20 March 2022

Accepted: 18 May 2022

First Online: 22 June 2022

Conflict of interest

: The authors declare that they have no conflict of interest.