Optimizing the Microstructures of Inclined Deposition to Improve the Photoelectric Properties of ZnO Thin Films
Crossref DOI link: https://doi.org/10.1007/s11664-024-11220-8
Published Online: 2024-06-11
Published Print: 2024-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Hu, Shao-Hwa
Lin, Yen-Sheng
Su, Shui-Hsiang
Dai, Hang
He, Jing-Shi
Text and Data Mining valid from 2024-06-11
Version of Record valid from 2024-06-11
Article History
Received: 5 April 2024
Accepted: 28 May 2024
First Online: 11 June 2024
Conflict of Interest
: The authors declare that they have no conflict of interest.