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Atomic-Scale Material Removal Mechanisms in 3C-SiC Nano-Polishing: Molecular Dynamics Insights

Published Online: 2026-02-11

Published Print: 2026-04

Authors

Li, Duo

Li, Ruihan

Long, Chao

Kang, Shuhao

Liu, Huan https://orcid.org/0000-0001-7462-9715
Funding

Funding for this research was provided by:

National Natural Science Foundation of China (52405585)

Postdoctoral Fellowship Program of CPSF (GZC20242223)
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Text and Data Mining valid from 2026-02-11

Version of Record valid from 2026-02-11
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Article History

Received: 8 September 2025

Accepted: 21 January 2026

First Online: 11 February 2026

Conflict of interest

: The authors declare that they have no conflict of interest.

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