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Fabrication of Low-Resistance Ru Films by Sputtering in Ar or Kr and Gas Backscattering Behavior

Published Online: 2026-04-08

Published Print: 2026-06

Authors

Yokoyama, Yamato

Kawamura, Midori https://orcid.org/0000-0001-5197-847X
Kiba, Takayuki
Funding

Funding for this research was provided by:

Izumi Science and Technology Foundation (2023-J-070)
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Text and Data Mining valid from 2026-04-08

Version of Record valid from 2026-04-08
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Article History

Received: 5 January 2026

Accepted: 26 March 2026

First Online: 8 April 2026

Conflict of interest

: All authors have no conflicts of interest.

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