Molecular Dynamics Study of Substrate Temperature and Incident Energy Influence on the Crystallization Behavior of Alumina Thin Film Deposition Process
Crossref DOI link: https://doi.org/10.1007/s11665-024-10065-w
Published Online: 2024-09-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Jiang, Wei
Sun, Yuanliang
Zhou, Guangxue
Liu, Yang
Dai, Hongbin
Wang, Enhao
Text and Data Mining valid from 2024-09-10
Version of Record valid from 2024-09-10
Article History
Received: 5 January 2024
Revised: 1 April 2024
Accepted: 3 May 2024
First Online: 10 September 2024