A Modified Bosch Process of SF6/C4F8/O2 ICP-RIE Si Etching
Crossref DOI link: https://doi.org/10.1007/s11665-024-10514-6
Published Online: 2024-12-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Wang, Yi
Chen, Luhua
Zeng, Xiangzhe
Song, Jinhui https://orcid.org/0000-0002-0042-2014
Text and Data Mining valid from 2024-12-05
Version of Record valid from 2024-12-05
Article History
Received: 17 May 2024
Revised: 24 September 2024
Accepted: 29 October 2024
First Online: 5 December 2024
Conflict of interest
: The authors declare that they have no conflict of interest.