Low-k integration: Gas screening for cryogenic etching and plasma damage mitigation
Crossref DOI link: https://doi.org/10.1007/s11705-019-1820-5
Published Online: 2019-07-24
Published Print: 2019-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Chanson, Romain
Dussart, Remi
Tillocher, Thomas
Lefaucheux, P.
Dussarrat, Christian
de Marneffe, Jean François
Text and Data Mining valid from 2019-07-24
Version of Record valid from 2019-07-24
Article History
Received: 31 August 2018
Accepted: 28 January 2019
First Online: 24 July 2019