Plasma enhanced chemical vapor deposition of excellent a-Si:H passivation layers for a-Si:H/c-Si heterojunction solar cells at high pressure and high power
Crossref DOI link: https://doi.org/10.1007/s11708-016-0437-3
Published Online: 2016-11-19
Published Print: 2017-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Zhao, Lei
Zhang, Wenbin
Chen, Jingwei
Diao, Hongwei
Wang, Qi
Wang, Wenjing
License valid from 2016-11-19