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Etch characteristics of CoFeB thin films and magnetic tunnel junction stacks in a H2O/CH3OH plasma

Crossref DOI link: https://doi.org/10.1007/s11814-014-0254-5

Published Online: 2014-11-23

Published Print: 2014-12

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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