Effect of oxygen flow rate on the electrical and optical characteristics of dopantless tin oxide films fabricated by low pressure chemical vapor deposition
Crossref DOI link: https://doi.org/10.1007/s11814-016-0151-1
Published Online: 2016-07-19
Published Print: 2016-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kim, Jun-Hyun
Lee, Hae-Min
Kang, Doo Won
Lee, Kyung Mi
Kim, Chang-Koo
License valid from 2016-07-19