Damage to amorphous indium-gallium-zinc-oxide thin film transistors under Cl2 and BCl3 plasma
Crossref DOI link: https://doi.org/10.1007/s11814-018-0034-8
Published Online: 2018-04-02
Published Print: 2018-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Choi, Jong Hoon
Kim, Sung Jin
Kim, Hyung Tae
Cho, Sung Min
Text and Data Mining valid from 2018-04-02
Article History
Received: 28 October 2017
Accepted: 12 February 2018
First Online: 2 April 2018