Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
Crossref DOI link: https://doi.org/10.1007/s11814-018-0179-5
Published Online: 2018-11-19
Published Print: 2018-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Ji, Su-Hyeon
Jang, Woo-Sung
Son, Jeong-Wook
Kim, Do-Heyoung
Text and Data Mining valid from 2018-11-19
Article History
Received: 4 September 2018
Accepted: 23 October 2018
First Online: 19 November 2018