Hydrogenated amorphous carbon films deposited using plasma enhanced chemical vapor deposition processes
Crossref DOI link: https://doi.org/10.1007/s11814-023-1443-x
Published Online: 2023-05-17
Published Print: 2023-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Li, Jie
Chae, Heeyeop
Text and Data Mining valid from 2023-05-17
Version of Record valid from 2023-05-17
Article History
Received: 15 December 2022
Revised: 29 January 2023
Accepted: 5 February 2023
First Online: 17 May 2023