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Anisotropic Etching of Cobalt Thin Films Using High Density Plasma of Ethylenediamine/Ar Gas Mixture

Published Online: 2026-01-20

Published Print: 2026-04

Authors

Yang, Hong Ju

Oh, Kyung Ho

Chung, Chee Won https://orcid.org/0000-0002-6729-9380
Funding

Funding for this research was provided by:

Ministry of Trade, Industry and Energy (RS-2025-02220023)
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Text and Data Mining valid from 2026-01-20

Version of Record valid from 2026-01-20
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Article History

Received: 27 August 2025

Revised: 3 December 2025

Accepted: 23 December 2025

First Online: 20 January 2026

Document is current