Effects of Substrate Bias on the Hardness and Resistivity of Reactively Sputtered TaN and TiN Thin Films
Crossref DOI link: https://doi.org/10.1007/s11837-015-1809-6
Published Online: 2016-01-19
Published Print: 2016-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Lu, Junqing
Arshi, Nishat
Funding for this research was provided by:
National Research Foundation of Korea (2010-0021715)
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