Ferroelectric Hf0.5Zr0.5O2 Thin Films: A Review of Recent Advances
Crossref DOI link: https://doi.org/10.1007/s11837-018-3140-5
Published Online: 2018-09-28
Published Print: 2019-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kim, Si Joon
Mohan, Jaidah
Summerfelt, Scott R.
Kim, Jiyoung
Funding for this research was provided by:
Texas Instruments
Text and Data Mining valid from 2018-09-28
Article History
Received: 7 July 2018
Accepted: 12 September 2018
First Online: 28 September 2018