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Growth of Ge Nanowires by Chemical Vapor Deposition at Atmospheric Pressure Using Readily Available Precursors GeO2 and C2H5OH

Crossref DOI link: https://doi.org/10.1007/s11837-020-04401-3

Published Online: 2020-10-13

Published Print: 2020-12

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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