Effects of Sputtering Pressure and Target–Substrate Distance on Phase Formation and Mechanical Behavior of Magnetron-Sputtered α-Ta Coatings
Crossref DOI link: https://doi.org/10.1007/s11837-026-08290-w
Published Online: 2026-04-17
Published Print: 2026-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Xu, Shupeng https://orcid.org/0009-0000-5517-5703
Liu, Cuicui
Luo, Lin
Text and Data Mining valid from 2026-04-17
Version of Record valid from 2026-04-17
Article History
Received: 7 October 2025
Accepted: 6 March 2026
First Online: 17 April 2026
Conflict of interest
: The authors report no conflicts of interest.