Effects of Hot Wire Temperature on Properties of GeSi:H Films with High Hydrogen Dilution by Hot-Wire Chemical Vapor Deposition
Crossref DOI link: https://doi.org/10.1007/s11859-019-1413-7
Published Online: 2019-09-12
Published Print: 2019-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Tai, Xin
Li, Xingbing
Zhen, Huang
Shen, Honglie
Li, Yufang
Huang, Haibin
Text and Data Mining valid from 2019-09-12
Version of Record valid from 2019-09-12
Article History
Received: 23 February 2019
First Online: 12 September 2019