Effect of sputtering parameters on the self-cleaning properties of amorphous titanium dioxide thin films
Crossref DOI link: https://doi.org/10.1007/s11998-017-9928-3
Published Online: 2017-06-15
Published Print: 2017-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Sabbah, Hussein
Funding for this research was provided by:
King Abdulaziz City for Science and Technology
License valid from 2017-06-15