Substrate bias voltage and deposition temperature dependence on properties of rf-magnetron sputtered titanium films on silicon (100)
Crossref DOI link: https://doi.org/10.1007/s12034-014-0722-x
Published Online: 2014-12-05
Published Print: 2014-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
PRIYADARSHINI, B GEETHA
AICH, SHAMPA
CHAKRABORTY, MADHUSUDAN
Text and Data Mining valid from 2014-12-01