Crossmark

Room temperature deposition of amorphous p-type CuFeO2 and fabrication of CuFeO2/n-Si heterojunction by RF sputtering method

Crossref DOI link: https://doi.org/10.1007/s12034-016-1209-8

Published Online: 2016-06-07

Published Print: 2016-06

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

ZHU, TAO

DENG, ZANHONG

FANG, XIAODONG

DONG, WEIWEI

SHAO, JINGZHEN

TAO, RUHUA

WANG, SHIMAO
Funding

Funding for this research was provided by:

National Natural Science Foundation of China (51172237)

National Natural Science Foundation of China (61306083)
License Information

License valid from 2016-06-01