Interplay of the influence of oxygen partial pressure and rf power on the properties of rf-magnetron-sputtered AZO thin films
Crossref DOI link: https://doi.org/10.1007/s12034-017-1404-2
Published Online: 2017-07-25
Published Print: 2017-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kassis, A
Saad, M
Nounou, F
License valid from 2017-07-25
