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Probing of the influence of bilayer geometry, substrate temperature and post-deposition annealing on Si and Cr thin film interdiffusion through Raman spectroscopy

Crossref DOI link: https://doi.org/10.1007/s12034-022-02701-9

Published Online: 2022-07-06

Published Print: 2022-09

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Naidu, K Lakshun https://orcid.org/0000-0001-5019-8180
Mohiddon, Md Ahamad

Krishna, M Ghanashyam
Funding

Funding for this research was provided by:

DST-ITPAR Programme, India
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Text and Data Mining valid from 2022-07-06

Version of Record valid from 2022-07-06
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Article History

Received: 22 October 2021

Accepted: 26 February 2022

First Online: 6 July 2022

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