Comparative study of discharge characteristics and associated film growth for post-cathode and inverted cylindrical magnetron sputtering
Crossref DOI link: https://doi.org/10.1007/s12043-018-1711-1
Published Online: 2019-02-15
Published Print: 2019-04
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Rane, R
Joshi, A
Akkireddy, S
Mukherjee, S
Text and Data Mining valid from 2019-02-15
Article History
Received: 27 February 2018
Revised: 9 August 2018
Accepted: 29 August 2018
First Online: 15 February 2019