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Laser annealing of SiO2 film deposited by ICPECVD for fabrication of silicon based low loss waveguide

Crossref DOI link: https://doi.org/10.1007/s12200-016-0616-1

Published Online: 2016-03-29

Published Print: 2016-06

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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