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A rasterization method for generating exposure pattern images with optical maskless lithography

Crossref DOI link: https://doi.org/10.1007/s12206-018-0431-2

Published Online: 2018-05-15

Published Print: 2018-05

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Lee, Jinwon

Lee, Hyungku

Yang, Jeongsam
License Information

Text and Data Mining valid from 2018-05-01
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Article History

Received: 12 June 2017

Revised: 26 January 2018

Accepted: 30 January 2018

First Online: 15 May 2018