Prediction model of aspect ratio-dependent etching rate through molecular dynamics-based data processing
Crossref DOI link: https://doi.org/10.1007/s12206-025-0224-3
Published Online: 2025-03-03
Published Print: 2025-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Um, Junghwan
Moon, Sunil
Cho, Sung-il
Kang, Keonwook
Text and Data Mining valid from 2025-03-01
Version of Record valid from 2025-03-01
Article History
Received: 5 August 2024
Revised: 21 October 2024
Accepted: 26 November 2024
First Online: 3 March 2025