Role of the carrier gas flow rate in monolayer MoS2 growth by modified chemical vapor deposition
Crossref DOI link: https://doi.org/10.1007/s12274-016-1323-3
Published Online: 2016-12-01
Published Print: 2017-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Liu, Hengchang
Zhu, Yuanhu
Meng, Qinglong
Lu, Xiaowei
Kong, Shuang
Huang, Zhiwei
Jiang, Peng
Bao, Xinhe
License valid from 2016-12-01