Precise control of graphene etching by remote hydrogen plasma
Crossref DOI link: https://doi.org/10.1007/s12274-018-2192-8
Published Online: 2018-09-15
Published Print: 2019-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Ma, Bangjun
Ren, Shizhao
Wang, Peiqi
Jia, Chuancheng
Guo, Xuefeng
Text and Data Mining valid from 2018-09-15
Article History
Received: 4 December 2017
Revised: 20 June 2018
Accepted: 5 September 2018
First Online: 15 September 2018