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High-Performance Ink-Synthesized Cu-Gate Thin-Film Transistor with Diffusion Barrier Formation

Crossref DOI link: https://doi.org/10.1007/s12540-018-0045-3

Published Online: 2018-02-28

Published Print: 2018-05

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Woo, Whang Je

Nam, Taewook

Oh, Il-Kwon

Maeng, Wanjoo

Kim, Hyungjun
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Text and Data Mining valid from 2018-02-28
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Article History

Received: 4 May 2017

Accepted: 15 November 2017

First Online: 28 February 2018