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DC and Analog/RF Performance Evaluation Using Dual Metal Gate Work Function Engineering of Junctionless Cylindrical Gate All Around Si Nanowire MOSFET Using NEGF Approach for Upcoming Sub 5 nm Technology Node

Crossref DOI link: https://doi.org/10.1007/s12541-024-01023-6

Published Online: 2024-05-31

Published Print: 2024-09

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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