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Novel Atomic Layer Processes for Semiconductor Manufacturing: Area Selective Deposition, Atomic Layer Annealing, and Atomic Layer Etching

Published Online: 2025-09-15

Published Print: 2025-09

Authors

Lee, Sangwon

Lee, Gyuha

Oh, Jeongmin

An, Jihwan https://orcid.org/0000-0002-7697-9935
Funding

Funding for this research was provided by:

Pohang University of Science and Technology
License Information

Text and Data Mining valid from 2025-09-01

Version of Record valid from 2025-09-15
More Information

Article History

Received: 10 June 2025

Revised: 28 July 2025

Accepted: 12 August 2025

First Online: 15 September 2025

Declarations

:

: All authors have reviewed and approved the final version of this manuscript and give their explicit consent for its submission and publication.

: The authors declare no competing financial or non-financial interests.

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