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Preparation and optoelectronic properties of a‐IGZO thin films deposited by RF magnetron sputtering at different working pressures

Crossref DOI link: https://doi.org/10.1007/s12598-014-0314-3

Published Online: 2014-06-17

Published Print: 2018-07

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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