Crossmark

Chemical vapor deposition growth and transport properties of MoS <sub>2</sub> –2H thin layers using molybdenum and sulfur as precursors

Crossref DOI link: https://doi.org/10.1007/s12598-015-0599-x

Published Online: 2015-09-18

Published Print: 2022-10

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Shi, Zhi‐Tian

Zhao, Hong‐Bin

Chen, Xiao‐Qiang

Wu, Ge‐Ming

Wei, Feng https://orcid.org/0000-0003-0234-0730
Tu, Hai‐Ling
License Information

Version of Record valid from 2015-09-18

Text and Data Mining valid from 2015-09-18

Text and Data Mining valid from 2015-09-18

Version of Record valid from 2015-09-18
More Information

Article History

Received: 8 August 2014

Revised: 15 January 2015

Accepted: 20 August 2015

First Online: 18 September 2015