Chemical vapor deposition growth and transport properties of MoS2–2H thin layers using molybdenum and sulfur as precursors
Crossref DOI link: https://doi.org/10.1007/s12598-015-0599-x
Published Online: 2015-09-18
Published Print: 2022-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Shi, Zhi-Tian
Zhao, Hong-Bin
Chen, Xiao-Qiang
Wu, Ge-Ming
Wei, Feng http://orcid.org/0000-0003-0234-0730
Tu, Hai-Ling
Text and Data Mining valid from 2015-09-18
Version of Record valid from 2015-09-18
Article History
Received: 8 August 2014
Revised: 15 January 2015
Accepted: 20 August 2015
First Online: 18 September 2015